مكتبة جرير

Chemical Vapour Deposition (CVD): Advances

Technology and Applications

كتاب مطبوع
307ر.س.
شامل ضريبة القيمة المضافة
وحدة البيع: EACH
18ر.س.شهرياً/24 شهر
المؤلف:Choy, Kwang-Leong
تاريخ النشر: 2021
تصنيف الكتاب:التربية والتعليم,الكتب الانجليزية,الكتب الانجليزية,
عدد الصفحات:418 Pages
الصيغة:غلاف ورقي
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307ر.س.
شامل الضريبة

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أو

عن المنتج

This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films.

Features

  • Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings
  • Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges
  • Covers thin and thick films and composites
  • Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability

Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.

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المواصفات

رقم الصنف9780367780111
رقم المصنع9780367780111
تاريخ النشر2021
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